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Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition
Lau, Yik-Sze1; Chan, Man-Nin2; Poon, Hon-Yin1,2; Tan, Yan3; Lee, Shun-Cheng3; Li, Jianjun4; Ho, Kin-Fai1,2
Corresponding AuthorHo, Kin-Fai(kfho@cuhk.edu.hk)
2021-07-01
Source PublicationATMOSPHERE
Volume12Issue:7Pages:16
AbstractIn the current study, the photooxidation reaction of toluene (C7H8) was investigated in a Potential Aerosol Mass Oxidation Flow Reactor (PAM OFR). The hydroxyl radical (OH) exposure of toluene in the PAM OFR ranged from 0.4 to 1.4 x 10(12) molec cm(-3) s, which is equivalent to 3 to 12 days of atmospheric oxidation. A proton transfer reaction-mass spectrometer (PTR-MS) and a scanning mobility particle sizer (SMPS) were used to study the gas-phase products formed and particle number changes of the oxidation reaction in PAM OFR. The secondary organic aerosol (SOA) formed in the PAM OFR was also collected for off-line chemical analysis. Key gas-phase reaction products of toluene, including glyoxal, methyl glyoxal, unsaturated carbonyl compounds, and benzaldehyde, were identified by the PTR-MS. Second generation products, including acetic acid, formaldehyde, formic acid, and acetaldehyde, were also detected. By comparing the mass spectrums obtained under different OH exposures and relative humidity (RH), changes in the two parameters have minimal effects on the composition of gas-phase products formed, expect for the spectrum obtained at OH exposure of 0.4 x 10(12) cm(-3) s and RH = 17%, which is slightly different from other spectrums. SMPS results showed that particle mass concentration increases with increasing OH exposure, while particle number concentration first increases and then decreases with increasing OH exposure. This result probably suggests the formation of oligomers at high OH exposure conditions. Off-line chemical analysis of the SOA sample was dominated by C4 diacids, including malic acid, citramalic acid, and tartaric acid. The well-known toluene SOA marker 2,3-Dihydroxy-4-oxopentanoic acid, as well as 2,3-dihydroxyglutaric acid, which has not been identified in previous toluene photooxidation experiments, were also detected in the SOA sample. Our results showed good agreements with the results of previous smog chamber studies of toluene photooxidation reaction, and they suggested that using PAM OFR for studies of oxidation reaction of different VOCs can be atmospherically relevant.
KeywordPotential Aerosol Mass (PAM) toluene PTR-MS photooxidation ageing
DOI10.3390/atmos12070915
WOS KeywordSECONDARY ORGANIC AEROSOL ; AIRBORNE PARTICULATE MATTER ; FLOW REACTORS ; HUMAN HEALTH ; OXIDATION ; EMISSIONS ; NOX ; AIR ; SOA ; SEMIVOLATILE
Indexed BySCI ; SCI
Language英语
Funding ProjectResearch Grant Council of the Hong Kong Special Administrative Region China[T24-504/17-N] ; Research Grant Council of the Hong Kong Special Administrative Region China[CUHK 14205318]
WOS Research AreaEnvironmental Sciences & Ecology ; Meteorology & Atmospheric Sciences
Funding OrganizationResearch Grant Council of the Hong Kong Special Administrative Region China
WOS SubjectEnvironmental Sciences ; Meteorology & Atmospheric Sciences
WOS IDWOS:000678139700001
PublisherMDPI
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ieecas.cn/handle/361006/16883
Collection粉尘与环境研究室
Corresponding AuthorHo, Kin-Fai
Affiliation1.Chinese Univ Hong Kong, JC Sch Publ Hlth & Primary Care, Hong Kong, Peoples R China
2.Chinese Univ Hong Kong, Earth Syst Sci Programme, Hong Kong, Peoples R China
3.Hong Kong Polytech Univ, Dept Civil & Struct Engn, Hong Kong, Peoples R China
4.Chinese Acad Sci, Inst Earth Environm, State Key Lab Loess & Quaternary Geol, Xian 710061, Peoples R China
Recommended Citation
GB/T 7714
Lau, Yik-Sze,Chan, Man-Nin,Poon, Hon-Yin,et al. Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition[J]. ATMOSPHERE,2021,12(7):16.
APA Lau, Yik-Sze.,Chan, Man-Nin.,Poon, Hon-Yin.,Tan, Yan.,Lee, Shun-Cheng.,...&Ho, Kin-Fai.(2021).Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition.ATMOSPHERE,12(7),16.
MLA Lau, Yik-Sze,et al."Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition".ATMOSPHERE 12.7(2021):16.
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