Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition

doi:10.3390/atmos12070915

IEECAS OpenIR > 粉尘与环境研究室

	Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition
	Lau, Yik-Sze 1; Chan, Man-Nin 2; Poon, Hon-Yin 1,2; Tan, Yan 3; Lee, Shun-Cheng 3; Li, Jianjun 4; Ho, Kin-Fai 1,2
通讯作者	Ho, Kin-Fai(kfho@cuhk.edu.hk)
	2021-07-01
发表期刊	ATMOSPHERE
卷号	12 期号:7 页码:16
摘要	In the current study, the photooxidation reaction of toluene (C7H8) was investigated in a Potential Aerosol Mass Oxidation Flow Reactor (PAM OFR). The hydroxyl radical (OH) exposure of toluene in the PAM OFR ranged from 0.4 to 1.4 x 10(12) molec cm(-3) s, which is equivalent to 3 to 12 days of atmospheric oxidation. A proton transfer reaction-mass spectrometer (PTR-MS) and a scanning mobility particle sizer (SMPS) were used to study the gas-phase products formed and particle number changes of the oxidation reaction in PAM OFR. The secondary organic aerosol (SOA) formed in the PAM OFR was also collected for off-line chemical analysis. Key gas-phase reaction products of toluene, including glyoxal, methyl glyoxal, unsaturated carbonyl compounds, and benzaldehyde, were identified by the PTR-MS. Second generation products, including acetic acid, formaldehyde, formic acid, and acetaldehyde, were also detected. By comparing the mass spectrums obtained under different OH exposures and relative humidity (RH), changes in the two parameters have minimal effects on the composition of gas-phase products formed, expect for the spectrum obtained at OH exposure of 0.4 x 10(12) cm(-3) s and RH = 17%, which is slightly different from other spectrums. SMPS results showed that particle mass concentration increases with increasing OH exposure, while particle number concentration first increases and then decreases with increasing OH exposure. This result probably suggests the formation of oligomers at high OH exposure conditions. Off-line chemical analysis of the SOA sample was dominated by C4 diacids, including malic acid, citramalic acid, and tartaric acid. The well-known toluene SOA marker 2,3-Dihydroxy-4-oxopentanoic acid, as well as 2,3-dihydroxyglutaric acid, which has not been identified in previous toluene photooxidation experiments, were also detected in the SOA sample. Our results showed good agreements with the results of previous smog chamber studies of toluene photooxidation reaction, and they suggested that using PAM OFR for studies of oxidation reaction of different VOCs can be atmospherically relevant.
关键词	Potential Aerosol Mass (PAM) toluene PTR-MS photooxidation ageing
DOI	10.3390/atmos12070915
关键词[WOS]	SECONDARY ORGANIC AEROSOL ; AIRBORNE PARTICULATE MATTER ; FLOW REACTORS ; HUMAN HEALTH ; OXIDATION ; EMISSIONS ; NOX ; AIR ; SOA ; SEMIVOLATILE
收录类别	SCI ; SCI
语种	英语
资助项目	Research Grant Council of the Hong Kong Special Administrative Region China[T24-504/17-N] ; Research Grant Council of the Hong Kong Special Administrative Region China[CUHK 14205318]
WOS研究方向	Environmental Sciences & Ecology ; Meteorology & Atmospheric Sciences
项目资助者	Research Grant Council of the Hong Kong Special Administrative Region China
WOS类目	Environmental Sciences ; Meteorology & Atmospheric Sciences
WOS记录号	WOS:000678139700001
出版者	MDPI
引用统计	被引频次：7[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.ieecas.cn/handle/361006/16883
专题	粉尘与环境研究室
通讯作者	Ho, Kin-Fai
作者单位	1.Chinese Univ Hong Kong, JC Sch Publ Hlth & Primary Care, Hong Kong, Peoples R China 2.Chinese Univ Hong Kong, Earth Syst Sci Programme, Hong Kong, Peoples R China 3.Hong Kong Polytech Univ, Dept Civil & Struct Engn, Hong Kong, Peoples R China 4.Chinese Acad Sci, Inst Earth Environm, State Key Lab Loess & Quaternary Geol, Xian 710061, Peoples R China
推荐引用方式 GB/T 7714	Lau, Yik-Sze,Chan, Man-Nin,Poon, Hon-Yin,et al. Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition[J]. ATMOSPHERE,2021,12(7):16.
APA	Lau, Yik-Sze.,Chan, Man-Nin.,Poon, Hon-Yin.,Tan, Yan.,Lee, Shun-Cheng.,...&Ho, Kin-Fai.(2021).Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition.ATMOSPHERE,12(7),16.
MLA	Lau, Yik-Sze,et al."Chemical Composition of Gas and Particle Phase Products of Toluene Photooxidation Reaction under High OH Exposure Condition".ATMOSPHERE 12.7(2021):16.